The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 16, 1991

Filed:

Oct. 12, 1990
Applicant:
Inventors:

David G Shaw, Tucson, AZ (US);

Angelo Yializis, Tucson, AZ (US);

Donald S Strycker, Glen Falls, NY (US);

Mooyoung Ham, Scotia, NY (US);

Assignee:

Spectrum Control, Inc., Erie, PA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B32B / ;
U.S. Cl.
CPC ...
428461 ; 118 501 ; 118718 ; 118719 ; 118730 ; 427 44 ; 427 81 ; 427251 ; 4272556 ; 428515 ;
Abstract

A high speed process for forming a multi layered thin film structure in a vacuum wherein each film is less than about four microns thick and the total layers can reach upwards to 4,000 or more. The polymeric layers are formed of a cross linked component selected from the group consisting of polyfunctional acrylates and mixtures of polyfunctional acrylates and monocrylates with the component having a preferable molecular weight of between 200 and 300 and a vapor pressure preferably in excess of 1.times.10.sup.-2 Torr. The polymeric layers may be interleaved with metal layers.


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