The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 09, 1991
Filed:
Jan. 05, 1987
ISL Ventures, Inc., Golden, CO (US);
Abstract
A method of isolating a contaminated geological formation or aquifer is disclosed in which the formation is encapsulated by impermeable barriers. A grid of wells is drilled into the formation. A horizontal barrier is formed below the contaminated formation by creating an overlapping pattern of horizontally-oriented fractures filled with polymer radiating from each of these wells. A horizontal barrier may also be formed above the top surface of the contaminated formation if necessary. A ring of boundary wells may also be drilled surrounding the contaminated formation. The strata around each boundary well are fractured, and a polymer is then injected to form a vertical barrier around the periphery of the contaminated formation. In addition, water may be injected under pressure into guard wells between the contaminated formation and the vertical and/or horizontal barriers to further reduce any migration of pollutants into neighboring formations.