The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 09, 1991

Filed:

Mar. 05, 1990
Applicant:
Inventor:

David N Bull, Brockport, NY (US);

Assignee:

Eastman Kodak Company, Rochester, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B23C / ; B23Q / ;
U.S. Cl.
CPC ...
5128 / ; 51235 ;
Abstract

A technique for sawing substrates on a chuck wherein the substrate is secured to a layer of a first sawing tape, and is placed on the major surface of a chuck with a second tape therebetween. The second tape comprises both a first major surface with a low surface tension effect that is in contact with the major surface of the chuck, and a multitude of perforations or pinholes therein. Vacuum is applied to both the channels in the major surface of the chuck and the pinholes in the second tape, to securely hole the substrate to the chuck during the sawing of the substrate. When the sawing is completed, the vacuum is removed and either atmospheric pressure or pressurized air is applied to the channels of the chuck, and the combination of the substrate, first sawing tape and second tape are easily removable because of the low surface tension effect of the first major surface of the second tape with the major surface of the chuck.


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Bull, David. (1991). Sawing method for substrate cutting operations (U.S. Patent No. 5029418). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5029418

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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