The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 25, 1991
Filed:
Dec. 06, 1989
Shogo Takahashi, Hyogo, JP;
Mitsubishi Denki Kabushiki Kaisha, Tokyo, JP;
Abstract
A planar type semiconductor laser having p-side and n-side electrodes on the same side of the substrate. The substrate carries a number of layers including lower and upper cladding layers sandwiching an active layer. Both of the cladding layers are of n-type material. A pair of p-type diffusion regions serve to define the width of an undiordered active stripe in the active layer. A first relatively deep diffusion region penetrates both cladding layers and extends into the substrate. A second shallower diffusion region spaced, from the first, penetrates only to the lower cladding layer and leaves a channel below the diffusion front in the lower cladding layer for conduction of carriers. The distance between the p-type diffusion regions defines the width of the active layer. An n-side electrode is formed on the upper surface of the semiconductor device and in electrical contact with the n-type cladding layers. A p-side electrode is formed on the upper surface of the semiconductor layer in electrical contact with the first p-type diffusion region.