The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 25, 1991

Filed:

Sep. 06, 1989
Applicant:
Inventor:

Jacob Y Wong, Santa Barbara, CA (US);

Assignee:

Gaztech Corporation, Goleta, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01J / ; G01J / ;
U.S. Cl.
CPC ...
250343 ; 250339 ; 250352 ;
Abstract

An instrument for determining the concentration of a particular gas that might be present in a sample has no moving parts and is extremely compact. The instrument uses as a source of radiation a device that has a radiating element whose temperature is alternated between T.sub.1 and T.sub.2 and whose spectrum approximates that of a blackbody. Radiation from this source is passed through a dual pass band filter that has two non-overlapping pass bands, one of which is centered at a wavelength at which the gas absorbs and the other of which is centered at a wavelength at which the sample does not absorb radiation. After passing through this filter, the radiation passes through the sample chamber and then is intercepted by a detector which produces an electrical signal determined by the radiation intercepted. The electrical signal is processed to provide an indication of the concentration of the gas.


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