The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 25, 1991
Filed:
Jan. 25, 1989
Applicant:
Inventors:
Nikolaos A Economu, Thessaloniki, GR;
Douglas B Meakin, Harrow-on-the-Hill, GB;
Assignee:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C / ; H01L / ;
U.S. Cl.
CPC ...
4272481 ; 427255 ; 437233 ;
Abstract
A deposition process includes the steps of heating a substrate, and passing silane gas over the substrate such that the heated substrate causes decomposition of the silane gas thereby to cause deposition of polysilicon film on the substrate. The temperature of the substrate and the pressure of the silane gas are controlled so as to increase the grain size of the deposited films.
Quick Actions:
Economu, Nikolaos. (1991). Chemical vapor deposition process for depositing large-grain polysilicon (U.S. Patent No. 5026574). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5026574
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile