The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 25, 1991

Filed:

Sep. 26, 1988
Applicant:
Inventors:

Masatoshi Marui, Saitama, JP;

Tomonori Inage, Tokyo, JP;

Vuji Matsui, Kawagoe, JP;

Tazuko Ishizuka, Urawa, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02F / ;
U.S. Cl.
CPC ...
350351 ; 350334 ; 3503 / ; 350415 ; 353114 ;
Abstract

An exposure apparatus for use in fabricating a printed circuit board. A thermally-written liquid-crystal light valve is provided in which a pattern is formed by opaque portions and transparent portions. A writing optical system directs a heating spot light onto the light valve. The light valve and/or the heating spot light is movable, relative to the other. A projecting optical system is arranged which transmits a luminous flux emitted from a light source, through a liquid-crystal layer within the liquid-crystal light valve. The projecting optical system illuminates a subject with the transmitted luminous flux.


Find Patent Forward Citations

Marui, Masatoshi. (1991). Exposure apparatus (U.S. Patent No. 5026145). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5026145

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…