The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 18, 1991
Filed:
May. 23, 1989
Hajime Morishita, Tokyo, JP;
Nobuaki Hayashi, Saitama, JP;
Saburo Nonogaki, Tokyo, JP;
Michiaki Hashimoto, Sayama, JP;
Masato Ito, Kokubunji, JP;
Masahiro Nishizawa, Mobara, JP;
Kiyoshi Miura, Mobara, JP;
Yoshiyuki Odaka, Chiba, JP;
Hitachi, Ltd., , JP;
Abstract
This invention relates to a process for forming a pattern using a photosensitive composition comprising a polymeric azide and a high-molecular weight copolymer or polymer. The photosensitive composition comprises a copolymer containing at least a water-soluble non-photosensitive monomeric unit having an electrolytic functional group, a monomeric unit having an azido group and an electrolytic functional group and a high-soluble high molecular weight copolymer or polymer which exhibits reciprocity law failure characteristic.