The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 18, 1991
Filed:
Nov. 15, 1988
Takahiro Yamauchi, Tokyo, JP;
Oki Electric Industry Co., Ltd., Tokyo, JP;
Abstract
In the disclosed process for forming a fine pattern in a semiconductor device, an upperlayer polymeric film so photosensitive to ultraviolet light as to be opague to deep ultraviolet light upon exposure to ultraviolet light is formed on an underlayer resist photosensitive to deep ultraviolet light, provided on an underlaying layer, optionally with an interlayer formed as a barrier or isolation layer therebetween. After the upperlayer polymeric film is exposed through a mask to ultraviolet light to form therein areas opague to deep ultraviolet light with the other areas remaining transparent to deep ultraviolet light, the upperlayer polymeric film serves as a mask for the underlayer resist in subsequent blanket exposure to deep ultraviolet light. After removal of the upperlayer polymeric film and the interlayer if any, the underlayer resist is developed to form a pattern.