The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 18, 1991
Filed:
May. 03, 1989
Diwakar Garg, Macungie, PA (US);
Paul N Dyer, Allentown, PA (US);
Leslie E Schaffer, Macungie, PA (US);
Ernest L Wrecsics, Bethlehem, PA (US);
Duane Dimos, Upper Mount Clair, NJ (US);
Carl F Mueller, Easton, PA (US);
Air Products and Chemicals, Inc., Allentown, PA (US);
Abstract
The method for producing the disclosed material comprises chemical vapor depositing on the substrate a substantially columnar, intermediate layer of tungsten and chemical vapor depositing on the intermediate layer a non-columnar, substantially lamellar outer layer of a mixture of tungsten and tungsten carbide. The tungsten carbide comprises W.sub.2 C, W.sub.3 C, or a mixture of both wherein the ratio of the thickness of the tungsten intermediate layer to the thickness of the outer layer is at least: (a) 0.35 in the case of tungsten plus W.sub.2 C in the outer layer, (b) 0.6 in the case of a mixture of tungsten and W.sub.3 C in the outer layer and (c) 0.35 in the case of mixtures of tungsten and W.sub.2 C and W.sub.3 C in the outer layer. The chemical vapor deposition steps are carried out at pressures within the range of 1 Torr to 1,000 Torr and temperatures within the range of about 300.degree. to about 650.degree. C.