The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 18, 1991
Filed:
Oct. 16, 1989
Sanyo Electric Co., Ltd., Osaka, JP;
Abstract
The present invention relates to a novel dry-etching method for patterning a metallic film, whose surface is provided with an oxidized film, into an optional configuration by the use of the oxidized film. After drawing etching patterns of the metallic film by irradiating energy beam to the oxidized film formed on the surface of the metallic film, the dry-etching method according to the present invention causes the metallic film to expose itself to either radicals of reactive gas or to etching gas, and then selectively removes the area of metallic film in correspondence to the beam irradiated area of the oxidized film by applying chemical etching, thus eventually allowing the metallic film to be patterned into an optional configuration, without incuring physical damage to the etching face of the metallic film.