The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 18, 1991
Filed:
Aug. 15, 1989
Applicant:
Inventors:
Fukuji Matsumoto, Takefu, JP;
Yoshio Tawara, Fukui, JP;
Michio Hayashi, Takefu, JP;
Osamu Yamada, Fukui, JP;
Assignee:
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C21B / ;
U.S. Cl.
CPC ...
266283 ; 266280 ; 266286 ;
Abstract
An inner tube for use in a semiconductor diffusion furnace is provided comprising a liner or diffusion tube and an insulating layer formed on the entire outer surface of the tube by spraying, typically plasma spraying. The sprayed insulating layer is resistant to deterioration and peeling, ensuring an extended period of service for the tube.