The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 18, 1991

Filed:

Apr. 26, 1990
Applicant:
Inventor:

An-Gong Yeh, Broomall, PA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B02C / ;
U.S. Cl.
CPC ...
241 21 ; 241 30 ; 241 34 ; 241172 ;
Abstract

A method for optimizing the processing of continuous media mills is disclosed. It has been found that using a differential pressure device to measure the pressure drop across the mill allows the on line determination of the state of media fluidization in the mill. Operation within an optimum mill base flow rate range is needed to have good fluidization of the media so that grinding can be efficient. Using differential pressure measurement allows a precise determination of the mill base flow rate range which provides full fluidization of the media and mill base flow rate control within that range.


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