The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 11, 1991
Filed:
Dec. 27, 1989
Applicant:
Inventors:
Monti E Aklufi, San Diego, CA (US);
David W Brock, San Diego, CA (US);
Assignee:
The United States of America as represented by the Secretary of the Navy, Washington, DC (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B01J / ;
U.S. Cl.
CPC ...
422186 ; 427 38 ; 219 / ; 20415743 ;
Abstract
A plasma generator utilizes a dielectric member for carrying microwave energy from a microwave source directly into the hot zone of a thermally heated semiconductor process reaction chamber. The member carries the microwave energy much like fiber optics carries light so that the microwave energy may be delivered to and emitted at a specific preselected position within the chamber. A plasma can be formed and located directly over or near substrates so that a more highly controlled deposition and/or etching process may take place.