The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 11, 1991
Filed:
Nov. 03, 1989
Robert P Rhodes, Lincoln University, PA (US);
Hewlett-Packard Company, Palo Alto, CA (US);
Abstract
A method and apparatus for controlling measurement repeatability in spectrochemical analysis which analysis utilizes a plasma source is shown to include a plasma generator for providing energy to the plasma source to sustain plasma, a sensor for sensing the operating temperature of the plasma generator and a temperature controller for controlling the operating temperature of the plasma generator in response to the temperature sensed by the sensor. The temperature controller controls the operating temperature of the plasma generator either within a temperature range, such as between 100.degree. C. or at a set point temperature. In the case of a magnetron having heat conductive fins as the plasma generator, the sensor senses the temperature of at least one of said fins and the temperature controller includes a fan directed to move air across the fins and a speed controller for controlling the speed of the fan in response to the sensed temperature of the fins.