The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 04, 1991

Filed:

Oct. 18, 1990
Applicant:
Inventors:

John CC. Fan, Chestnut Hill, MA (US);

Paul M Zavracky, Norwood, MA (US);

Jagdish Narayan, Raleigh, NC (US);

Lisa P Allen, Norton, MA (US);

Duy-Phach Vu, Taunton, MA (US);

Assignee:

Kopin Corporation, Taunton, MA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C30B / ;
U.S. Cl.
CPC ...
15662071 ; 1566207 ; 15662072 ; 156D / ; 156D / ; 156D / ;
Abstract

A method for reducing defects after zone melting and recrystallization of semiconductor films formed on an insulator over a semiconductor substrate by selectively removing portion of a first layer over the semiconductor film, amorphizing the exposed film portion and laterally regrowing the amorphized region.


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