The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 04, 1991
Filed:
Aug. 31, 1990
Applicant:
Inventors:
Masatoshi Takita, Joetsu, JP;
Takaaki Shimizu, Joetsu, JP;
Assignee:
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
C03B / ;
U.S. Cl.
CPC ...
65 181 ; 65901 ; 501 12 ; 501 33 ;
Abstract
A method for manufacturing synthetic silica glass by reacting methyl silicate and aqueous ammonia, dispersing the silica particles produced in water, solidifying the silica by the addition of methyl silicate and heating, dehydrating, de-solventing, decarburizing and sintering the solid silica to produce a glass product. The sintered glass may be pulverized to produce a powder. The inventive method is easily carried out and avoids the high energy costs of the prior art. The glass product obtained exhibits excellent high temperature viscosity.