The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 28, 1991
Filed:
Dec. 07, 1989
Thomas C Gsell, Glen Cove, NY (US);
Isaac Rothman, Brooklyn, NY (US);
Pall Corporation, Glen Cove, NY (US);
Abstract
A porous polymeric medium having a low affinity for amide group-containing and adjuvant-containing materials is provided comprising a porous polyvinylidene difuoride substrate and a surface-modifying polymeric material having a low affinity for amide group-containing materials formed in situ at and covalently bonded to the surface of the porous polyvinylidene difluoride substrate, the surface-modifying polymeric material being formed from a monofunctional monomer having at least one hydroxyl group. Another embodiment that provides a porous polymeric medium having a low affinity for amide group-containing materials employs a supplemental monomer in combination with the monofunctional monomer having at least one hydroxyl group to form the surface-modifying polymeric material. The supplmental monomer or comonomer used is one which, when formed as a homopolymer, has a high affinity for amide group-containing materials.