The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 28, 1991

Filed:

Aug. 11, 1989
Applicant:
Inventor:

David F Muller, Boston, MA (US);

Assignee:

Summit Technology, Inc., Waltham, MA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A61N / ;
U.S. Cl.
CPC ...
606-5 ; 606 13 ; 128395 ; 128898 ; 350363 ; 2191216 ; 21912167 ; 21912169 ; 21912173 ; 21912185 ;
Abstract

A laser system for reprofiling a surface comprising a laser and an erodable mask disposed between the laser means and the surface for providing a predefined profile of resistance to erosion by laser radiation, and control for controlling the laser such that upon irradiation of the mask, a portion of the laser radiation is selectively absorbed and another portion is transmitted to the surface in accordance with the mask profile to selectively erode the surface. The mask can be connected to the support structure and disposed in optical alignment with the laser means and the cornea. The mask can be directed integrated with the support structure or, preferably, a transparent stage can be formed as part of the support structure to support and position the masking lens. In one preferred embodiment, the mask is spatially separated from the surface and imaged onto the surface, thereby permitting the use of an oversized mask, which is easier to form.


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