The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 21, 1991

Filed:

Apr. 13, 1989
Applicant:
Inventors:

Hiromasa Ogata, Tokyo, JP;

Koji Morioka, Tokyo, JP;

Susumu Ohmori, Tokyo, JP;

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D / ;
U.S. Cl.
CPC ...
55390 ;
Abstract

A gas treating apparatus including a treating flow passage having a first opening and a second opening through which the gas passes to be treated; a pair of ducts for transporting the treatment-target gas or an element-refreshing gas through the treating flow passage positioned between a third opening and a fourth opening; and a rotary frame for radially supporting the treating flow passage and unidirectionally rotatable relative to the pair of ducts. At the upper and lower sides in the rotational direction of the third and fourth openings, there are provided first sealing members. As these sealing members come into sliding contact with at least one of the sealing faces at the upper and lower sides and at the sides of the first opening and of the second opening, the members provide gas sealing effect between the treating flow passage and the pair of ducts positioned between the third and fourth openings and in the vicinity of the same.


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