The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 21, 1991

Filed:

Jul. 17, 1990
Applicant:
Inventors:

Fujio Horie, Nagoya, JP;

Kenji Matsubara, Aichi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
D05B / ;
U.S. Cl.
CPC ...
112454 ; 112458 ;
Abstract

In the sewing machine of this invention, the operator can confirm on the selected-mode display M9 provided in the display M4 that the selected mode is for writing the pattern and whether the selected pattern is for only one use or the selected pattern is to be stored in the nonvolatile storage M7. The pattern selector M2 selects at least two patterns from the pattern-data storage M1. The arrangement of the selected patterns is stored in the pattern storage M3. The stored arrangement of the patterns is stored in the nonvolatile storage M7. Through specified processes, the patterns reader M8 develops the arrangement of the pattern stored in the nonvolatile storage M7 into the pattern storage M3. The controller M6 sequentially reads the arrangement of the patterns developed in the pattern storage M3 and drives the sewing mechanism M5 to form the arrangement of the patterns on fabric. When the pattern to be used repeatedly is thus once entered, the pattern can repeatedly be stitched on fabric.


Find Patent Forward Citations

Loading…