The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 14, 1991
Filed:
Aug. 09, 1989
Hideo Ochi, Misato, JP;
Tomoyuki Kitaori, Misato, JP;
Somar Corporation, , JP;
Abstract
A novel copolymer containing a plurality of first and second monomer units having the following general formulas (I) and (II), respectively: ##STR1## wherein R.sub.1 stands for hydrogen or methyl and Ar stands for an aryl, ##STR2## wherein R.sub.2 stands for hydrogen or methyl and X stands for -CH.sub.2 CH.sub.2 -, -CH.sub.2 CH(OH)CH.sub.2 - or -CH.sub.2 CH(CH.sub.2 OH)- and Y stands for o- or p-chlorophenyl, the molar ratio of the first monomer unit to the second monomer unit being 94:6 to 98:2. The copolymer becomes insoluble to a developing liquid when exposed to high energy radiations and is used for forming resist pattern on a silicon wafer or the like substrate.