The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 07, 1991

Filed:

May. 15, 1986
Applicant:
Inventors:

David S Rickerby, Jesmond, GB;

Derek S Whitmell, Blewbury, GB;

Joseph P Coad, Uffington, GB;

Richard S Nelson, Goring-on-Thames, GB;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
20429805 ; 20419231 ;
Abstract

An apparatus for coating by sputter ion plating comprises a chamber having a gas inlet and outlet for passing gas under low pressure continuously therethrough; a cathode fabricated of coating material or precursor therefor positioned in the chamber; and means for generating a glow discharge within the chamber to sputter cathode material to form a coating thereof or of a product obtained therefrom on a substrate also positioned in the chamber. The cathode includes a plurality of projections (e.g. fins) extending from a surface, their disposition and geometry being such as to increase the effective ion current density in the chamber. In this way, high currents at low voltages and pressures may be achieved so that the apparatus can be used to coat a large substrate load, possibly at a higher coating rate.


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