The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 30, 1991
Filed:
Apr. 25, 1989
Applicant:
Inventor:
Susumu Tanaka, Hachioji, JP;
Assignee:
Tel Sagami Limited, Kanagawa, JP;
Primary Examiner:
Int. Cl.
CPC ...
B05D / ;
U.S. Cl.
CPC ...
427 39 ; 134-1 ; 134 19 ; 134 221 ; 427 38 ; 427 47 ; 427314 ; 427299 ;
Abstract
The method of the present invention for forming a high-quality thin film on a substrate comprises a step of introducing a cleaning gas into a treatment container, and a step of bringing the cleaning gas into a plasma state in an electric field and a magnetic field in the treatment container, thus cleaning the inside of the treatment container by the plasma. According to this method, impurities, which prevent a high-quality thin film from being formed on the surface of the substrate, can be completely eliminated in a short time period, thus allowing the formation of a high-quality thin film.