The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 23, 1991

Filed:

Mar. 23, 1990
Applicant:
Inventors:

Yutaka Hayashi, Ibaraki, JP;

Atuo Itoh, Tokyo, JP;

Mizuho Imai, Tokyo, JP;

Hideyo Iida, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05D / ; C03C / ;
U.S. Cl.
CPC ...
4271263 ; 427109 ; 427110 ; 4271262 ; 427166 ; 427168 ; 427314 ; 4274193 ; 4274192 ; 427226 ; 65 602 ; 65 6051 ; 65 6053 ;
Abstract

This invention relates to a method for forming a transparent conductive metal oxide film having good characteristic properties. The method comprises feeding an atomized or gasified starting material onto a substrate to form a metal oxide film on the substrate, wherein the substrate is heated to form a first metal oxide film having a good degree of orientation of crystals and a second film formation step wherein a second metal oxide film is formed on the first metal oxide film under higher substrate temperature conditions than those in the first film formation step to form a second metal oxide film having a degree of orientation of crystals in conformity with that of the first metal oxide film.


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