The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 23, 1991
Filed:
Mar. 01, 1990
Applicant:
Inventors:
Takeshi Harano, Yokohama, JP;
Satoru Takaki, Yokohama, JP;
Yuzo Shigesato, Yokohama, JP;
Koichi Suzuki, Yokohama, JP;
Naoki Hashimoto, Yokohama, JP;
Hiroyasu Kojima, Ebina, JP;
Takuji Oyama, Yokohama, JP;
Assignee:
Ashahi Glass Company, Ltd., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
B05D / ;
U.S. Cl.
CPC ...
427 37 ; 427 38 ; 427 42 ; 427 47 ; 427109 ; 4271262 ; 4271263 ; 427314 ; 427322 ;
Abstract
In a method of forming a transparent conductive film, an arc discharge type plasma produced by arc discharging is generated in an atmosphere wherein the pressure of an atmospheric gas is 3.0 .times. 10.sup.-4 Torr or higher; the plasma is converged onto a vapor deposition material for forming a transparent conductive film to thereby evaporate the vapor deposition material, whereby said transparent conductive film is formed on a substrate located above said vapor deposition material.