The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 23, 1991

Filed:

Feb. 02, 1990
Applicant:
Inventor:

Chung Y Lui, Lansdale, PA (US);

Assignee:

Merck & Co., Inc., Rahway, NJ (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A61K / ;
U.S. Cl.
CPC ...
424465 ; 424494 ; 424480 ;
Abstract

Sustained release formulations are disclosed which contain a therapeutically active medicament and a high and low viscosity HPMC and which exhibit a zero order release profile.


Find Patent Forward Citations

Lui, Chung. (1991). Sustained release with high and low viscosity hpmc (U.S. Patent No. 5009895). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5009895

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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