The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 23, 1991
Filed:
Aug. 17, 1989
James T Hall, Torrance, CA (US);
Hughes Aircraft Company, Los Angeles, CA (US);
Abstract
An error-compensated process for forming a multiple-notch optical filter which is characterized by a continually and accurately varying periodic profile. The optical medium if formed on a substrate so that the profile of the refractive index is multiply sinusoidally modulated to maintain Bragg's law for each component in the multiple-notch profile. In a preferred embodiment, as the optical medium is coated on the substrate, the depositing film is monitored by optical techniques, and feedback information is provided to a computer driven by a pre-programmed process control algorithm so that real time control of the manufacturing process may be accomplished.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile