The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 16, 1991
Filed:
Dec. 01, 1988
Koichi Moriizumi, Itami, JP;
Takeshi Fujino, Itami, JP;
Abstract
A method of preparing drawing data for a charged beam exposure system includes: constructing, from pattern data having a multiple hierarchical structure, reiterative units disposed in an array without any gap formed therebetween; converting the pattern data into first figure processing data including a total figure and reiterative units within the total area; dividing the total area of the first figure into equal area processing data fields for a charged beam exposure system, each field including a whole number of reiterative units, if any, thereby producing second figure processing data; performing figure modification processing with respect to features in a field outside reiterative units in the field and separately with respect to the reiterative units within the field, thereby producing third figure processing data; and converting the third figure processing data into suitable drawing data for the charged beam exposure system.