The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 02, 1991
Filed:
Jan. 30, 1990
Applicant:
Inventors:
Masato Kobayashi, Miyagi, JP;
Yoh-Ichi Yamaguchi, Tokyo, JP;
Minoru Sugawara, Tokyo, JP;
Kazuhide Yamashiro, Tokyo, JP;
Assignee:
Hoya Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G21K / ; H01L / ; B44C / ; C23F / ;
U.S. Cl.
CPC ...
378 35 ; 156626 ; 156643 ; 156644 ; 156646 ; 156653 ; 156656 ; 156657 ; 1566591 ; 156662 ; 20419237 ; 430-5 ;
Abstract
In a method of manufacturing an X-ray mask comprising a substrate, an X-ray transmission layer on the substrate, an X-ray absorption layer on the X-ray transmission layer, the X-ray transmission layer is flattened to remove undulation and to make roughness of the X-ray transmission layer smaller than 100 angstroms. The X-ray transmission layer may be formed by silicon carbide or silicon nitride. Alternatively, the X-ray transmission layer may have a multilayer structure of sandwiched structure comprising either a silicon carbide film or a silicon nitride film.