The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 02, 1991

Filed:

Feb. 06, 1990
Applicant:
Inventors:

Peter A Sardano, Fairport, NY (US);

Irvin J Kazmierczak, Rochester, NY (US);

Assignee:

Xerox Corporation, Stamford, CT (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B65H / ;
U.S. Cl.
CPC ...
271 35 ; 271126 ; 271160 ; 271165 ; 221231 ;
Abstract

In a retard type botton sheet separator/feeder 80, in which the bottom of a stack of original document sheets is driven downstream to a separation nip with a retard pad 62 by the planer upper flight of a driven frictional separator bottom feed belt 50, that feeding is assisted by a normal force applying ski or shoe unit 70. The unit 70 pivotally lowers arm assembly 76 so that a large area planar bottom of a ski 72 is overlying the belt 50. The ski 72 rides on the top of the stack with low friction with a preset downward normal force. A pivotal mounting 74 thereof allows the free self-pivoting of the bottom surface of the ski 72 into continuous alignment with the plane of the top of the stack, pressing the stack between the ski and an opposing feeding belt area which is also maintained uniformly planar by a special belt supporting system. Thus the normal force is distributed evenly over a relatively large area. A dual axis gimbaled mounting 74 of the ski 72 allows the ski to adjust to various different stack heights and maintain adequate total normal force while preventing high pressure points or pressure concentrations which could cause smearing by providing a large ski area of contact with evenly applied low pressure thereover.


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