The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 26, 1991

Filed:

Dec. 20, 1989
Applicant:
Inventors:

Akira Sano, Kawasaki, JP;

Hirofumi Kamiishi, Yokohama, JP;

Yoshimu Iwanami, Yokohama, JP;

Shigeki Yokoyama, Yokohama, JP;

Kazuo Matsuura, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C / ; B29C / ;
U.S. Cl.
CPC ...
264119 ; 264120 ; 264126 ;
Abstract

A process for the production of polyethylene materials oriented at a high level is disclosed in which a selected ethylene polymer as produced is extruded or rolled at a temperature lower than its melting point and subsequently subjected to stretching. The polymer is from 5 to 50 dl/g at 135.degree. C. in decalin in intrinsic viscosity and smaller than 60 .ANG. in crystal size on a plane (110) in the diffraction pattern.


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