The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 26, 1991
Filed:
Jun. 10, 1988
Applicant:
Inventors:
Charles L Nelson, Highland Park, IL (US);
Richard A Domanik, Libertyville, IL (US);
Assignee:
Abbott Laboratories, Abbott Park, IL (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01N / ;
U.S. Cl.
CPC ...
204412 ; 204165 ;
Abstract
An ultrathin selectively permeable membrane made by glow discharge plasma polymerization of a single siloxane monomer with the deposition of the polymer as a single layer upon a nonporous support material. The resulting membrane has an oxygen content between about 10% and 60% and is highly permselective. The support material can be an electrode, thereby forming an electrode that is resistant to fouling or contamination but readily accessible to oxygen.
Nelson, Charles. (1991). Plasma polymerized polysiloxane membrane (U.S. Patent No. 5002652). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5002652
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile