The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 26, 1991
Filed:
Mar. 16, 1989
Robert Aprahamian, Hermosa Beach, CA (US);
TRW Inc., Redondo Beach, CA (US);
Abstract
Apparatus and a corresponding method, for removing the effect of phase aberrations introduced into an incident light wave by a large optical element, such as a large concave mirror. Rather than building additional precision into the mirror, phase correction is effected by first collimating and phase conjugating the incident beam after reflection from the mirror, then expanding the beam again to fill the mirror. After its second reflection from the large mirror, the light beam is practically free of phase errors, since the phase conjugated beam is subject to substantially the same phase aberrating conditions as the incident beam. The apparatus may be used to produce an aberration-free image of a distant object, or to produce an aberration-free collimated light beam from a diffraction-limited laser source.