The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 19, 1991
Filed:
Sep. 07, 1989
Hideya Yamadera, Aichi, JP;
Yoshiki Seno, Aichi, JP;
Yasunori Taga, Aichi, JP;
Katsuhiko Ariga, Aichi, JP;
Tadashi Ozaki, Aichi, JP;
Naoki Hara, Mie, JP;
Haruhiko Inoue, Aichi, JP;
Kabushiki Kaisha Toyota Chuo Kenkyusho, Aichi, JP;
Nippondenso Co., Ltd., Kariya, JP;
Abstract
A thin film resistor for a strain gauge prepared by physical or chemical vapor deposition. The resistor contains 60 to 98 atomic % of chromium, 2 to 30 atomic % of oxygen, and 0 to 10 atomic % of a metal or semiconductor. These constituents are uniformly distributed. The thickness of the film is between 0.01 and 10 .mu.m. The metal is at least one of Al, Ti, Ta, Zr and In, and the semiconductor is at least one of silicon, germanium and boron. The thin film resistor has excellent resistance-strain characteristics and resistance-temperature characteristics, as well as high sensitivity and mechanical strength.