The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 19, 1991
Filed:
May. 24, 1989
Applicant:
Inventors:
Walter Fischer, Reinach, CH;
Marcus Baumann, Basle, CH;
Jurgen Finter, Freiburg, DE;
Vratislav Kvita, Reinach, CH;
Carl W Mayer, Riehen, CH;
Manfred Rembold, Aesch, CH;
Martin Roth, Giffers, CH;
Assignee:
Ciba-Geigy Corporation, Ardsley, NY (US);
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C07C / ; C07C / ;
U.S. Cl.
CPC ...
552201 ; 552202 ; 552203 ;
Abstract
Naphthacene-5,12-diones which are substituted by at least one organic thio radical are not only photoinitiators for the photopolymerization but also sensitizers for the photodimerization of ethylenically unsaturated compounds. Compositions made of these naphthacene-5,12-diones and ethylenically unsaturated compounds are suitable for the preparation of printing inks, paints, printing plates, resist materials or as image recording material.