The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 19, 1991
Filed:
Apr. 11, 1989
Kenichi Yanagi, Hiroshima, JP;
Toshio Taguchi, Hiroshima, JP;
Hajime Okita, Hiroshima, JP;
Heizaburo Furukawa, Hiroshima, JP;
Susumu Kamikawa, Hiroshima, JP;
Mitsubishi Jukogyo Kabushiki Kaisha, Tokyo, JP;
Abstract
In a continuous vacuum vapor deposition system, a reduced-pressure chamber is partitioned into a plurality of sub-chambers by seal devices each formed by one set of three pinch rolls arrayed in parallel on one plane or a single seal roll, and a pair of seal bars positioned on the same plane on the respective sides of the pinch roll or seal roll. Gaps between the pinch rolls or seal roll and seal bars are adapted to allow the base plate portions on the inlet side and on the outlet side, respectively, to pass therethrough. In each of the reduced-pressure sub-chambers are disposed a pair of deflector rolls so that the base plate portions on the inlet side and on the outlet side may be wrapped respectively around the pinch rolls or seal roll with a wrapping angle of 10 degrees or more.