The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 12, 1991

Filed:

Apr. 11, 1989
Applicant:
Inventors:

Brian J Joseph, Rochester, NY (US);

Thomas W Mort, Rochester, NY (US);

Philip A Stern, Rochester, NY (US);

Robert M Westcott, Brockport, NY (US);

Assignee:

Eastman Kodak Company, Rochester, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03G / ;
U.S. Cl.
CPC ...
355326 ; 118645 ; 355245 ;
Abstract

A support assembly, in an electrostatographic reproduction apparatus having multiple development stations respectively containing different color marking particles for selective development of a plurality of latent image-wise charge patterns on a moving dielectric member so that such apparatus is capable of making multi-color reproductions. The support assembly includes a plurality of members adapted to receive the plurality of development stations respectively. The plurality of members are simultaneously movable to a first position where development stations received by the members are remote from the dielectric member to facilitate removal of such development stations from the apparatus, and to a second position where such development stations are in juxtaposition with the dielectric member. Additionally, the plurality of members, once in said second position where development stations received by the members are located to bring marking particles into development contact with the dielectric member, are independently movable to a third position where such development stations are located to prevent marking particles from coming into contact with the dielectric member.


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