The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 12, 1991
Filed:
Dec. 29, 1989
Applicant:
Inventors:
Yoshiro Akagi, Osaka, JP;
Mariko Ishino, Nara, JP;
Atsuhisa Inoue, Nara, JP;
Shigeru Kaminishi, Nara, JP;
Hiroshi Taniguchi, Nara, JP;
Assignee:
Sharp Kabushiki Kaisha, Osaka, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05D / ; B32B / ; B32B / ; B32B / ;
U.S. Cl.
CPC ...
427 41 ; 427 44 ; 427 39 ; 427 38 ; 427166 ; 4272556 ; 4272481 ; 428435 ; 428458 ;
Abstract
A method of manufacturing a polyimide thin film is disclosed which comprises supplying vapors of a polyimide starting material comprising a plurality of polyimide forming monomers into a plasma atmosphere, transferring the ionized polyimide starting material, under an electric field, to the surface of a glass or metallic substrate and depositing the material thereon, and heating the same during or after deposition, thereby forming a polyimide thin film as an orientation film on the substrate.