The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 05, 1991
Filed:
Jun. 09, 1989
Applicant:
Inventors:
Assignee:
U.S. Philips Corporation, New York, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01R / ;
U.S. Cl.
CPC ...
324309 ; 324307 ;
Abstract
An MRI method is proposed where the profile distribution is automatically determined so that the information contents of the image are maximum, subject to the restriction that the total number of profiles used to obtain the image is predetermined. During the determination of the profile distribution, profiles will be selected which have a minium redundancy and a redundancy pattern r(k.sub.y) will be dynamically adapted as a function of the spatial frequency k.sub.y. The redundancy of a profile increases as the number of times that a profile has been measured increases and is high when a signal-to-noise ratio associated with the profile is very small.