The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 05, 1991
Filed:
Nov. 17, 1989
Masahiro Mimasaka, Kyoto, JP;
Abstract
A method of detecting an end point of surface treatment of a wafer includes the steps of: projecting coherent light onto an upper surface of the wafer provided with a layer to be treated; receiving superposed light caused by interference of light reflected on a surface of the layer to be treated and on the other surface thereof and converting it to a photoelectric signal; sampling the photoelectric signal; detecting a first point where a variation range caused by the interference in the sampled data becomes smaller than a predetermined value; detecting a second point where an extreme value of the variation of the photoelectric signal caused by the interference occurs prior to the first point; and determining the end point of treatment by prescribed calculation using the second point as a reference point. The detection of the first point may be incorrect depending on the detection conditions. However, the second point prior to the first point is detected in a relatively stable manner irrespective of the detecting conditions. Thus, since the end point of treatment is determined by the prescribed calculation using the second point as a reference point, the end point of treatment is detected correctly and with good repeatability.