The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 26, 1991
Filed:
Dec. 21, 1988
Applicant:
Inventors:
Assignee:
Matsushita Electric Industrial Co., Ltd., Osaka, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D / ;
U.S. Cl.
CPC ...
427 12 ; 427 35 ; 427 36 ; 427 38 ; 427 431 ; 427 531 ; 427261 ; 427299 ; 427333 ; 427343 ; 427344 ; 427404 ; 4274301 ;
Abstract
A responsive film containing a responsible group occuring a chemical reaction by energy beam is formed on an insulated substrate, and energy beam is irradiated in a pattern, and part of the responsive group is selectively deactivated or activated, and only the remaining portion of the responsive group of the responsive film is coupled with a chemical substance containing metal in a later process, and an ultrafine pattern of metal film is formed.
Ogawa, Kazufumi. (1991). Method for producing ultrathin metal film and ultrathin-thin metal (U.S. Patent No. 4996075). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4996075
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile