The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 26, 1991
Filed:
Sep. 15, 1989
Applicant:
Inventors:
Shigehiro Shimoyashiki, Hitachi, JP;
Ryuhei Kawabe, Hitachi, JP;
Assignee:
Hitachi, Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G21C / ;
U.S. Cl.
CPC ...
376313 ; 376309 ; 376305 ;
Abstract
A method of restraining a diffusion of tritium and an apparatus for same are disclosed. The method includes the step of disposing a hydrogen-absorbing metal in a tritium passage in a direction of diffusion of tritium so that the hydrogen-absorbing metal absorbs tritium to be diffused. The apparatus includes a hydrogen-absorbing metal surrounding a device of a fast breeder reactor. The tritium to be diffused can be readily captured. An arrangement of capturing the tritium permeating the device is simplified in the present invention.