The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 19, 1991
Filed:
Apr. 23, 1987
Mitsugi Suehiro, Tokyo, JP;
Toshikuni Sera, Hiroshima, JP;
Kenji Inoue, Hiroshima, JP;
Akira Shimada, Tokyo, JP;
Mitsubishi Jukogyo Kabushiki Kaisha, Tokyo, JP;
Abstract
The present invention is directed to a method for purifying a high-temperature reducing gas by continuously circulating the processes of reducing a regenerated absorbent with the high-temperature reducing gas, until concentrations of aimed reducing gases have become uniform on upstream and downstream sides of the absorbent, and absorbing sulfur compounds by the use of this absorbent and thereby removing these sulfur compounds therefrom; the aforesaid method being characterized by using at least three reactors filled with the absorbent, by consisting of the four steps of reduction, absorption, SO.sub.2 reduction and regeneration, and by comprising the steps of feeding a circulating gas from the regenerating step to the SO.sub.2 reducing step; converting an SO.sub.2 gas produced in the regenerating step and the SO.sub.2 reducing step into elemental sulfur and recovering the latter as liquid sulfur; and introducing a part of the SO.sub.2 gas into the reducing step and returning the remaining SO.sub.2 gas to the regenerating step.