The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 12, 1991
Filed:
Aug. 17, 1988
Hifumi Tamura, Hachiohji, JP;
Yoshinori Ikebe, Katsuta, JP;
Katsuhiko Muroyama, Nakaminato, JP;
Hiroyuki Sumiya, Ohmiyamachi, JP;
Hitachi, Ltd., Tokyo, JP;
Hitachi Instrument Engineering Co., Ltd., Ibaraki, JP;
Abstract
A method of neutralizing an accumulated charge on a surface of a specimen which is examined in a scanning electron microscope (SEM) or a scanning ion microprobe mass analyzer (IMA), utilizes an electrically conductive thin film deposited on a part of the specimen surface. The charge is due to irradiation by a primary charged particle beam from the SEM or IMA. The thin film is made conductivity with a specimen mount mounting the specimen, and the irradiating range of the primary beam covers at least a part of the thin film. Thus, the accumulated charge can be neutralized, thereby a resolution of the SEM being improved due to applying higher accelerating voltage for the primary beam, and measured data of higher reliability being obtained in the IMA.