The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 12, 1991
Filed:
Oct. 11, 1988
Ja-Young Koo, Plymouth, MN (US);
Chieh-Chun Chau, Midland, MI (US);
Joel R Racchini, St. Louis Park, MN (US);
Ritchie A Wessling, Berkeley, CA (US);
Matthew T Bishop, Midland, MI (US);
The Dow Chemical Company, Midland, MI (US);
Filmtec Corporation, Minneapolis, MN (US);
Abstract
A microporous polyetheretherketone (PEEK) membrane in the form of films and hollow fibers formed without sulfonating the PEEK polymer. Solid fibers and articles are also claimed. A method of making membranes, fibers and articles from solutions of PEEK in non-sulfonating acid solvents in claimed. Solvents include methane sulfonic acid and trifluoromethane sulfonic acid. Sulfuric acid may be used as a diluent in non-sulfonating amounts. PEEK membranes are used as supports for composite ultrafiltration and reverse osmosis membranes. A method of making membranes, fibers, and articles is also described.