The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 05, 1991
Filed:
Nov. 20, 1989
Kai K Mak, Concord, TN (US);
Rudy G Novak, Knoxville, TN (US);
International Technology Corporation, Knoxville, TN (US);
Abstract
The specification discloses a process for the treatment of waste gas containing hydrogen chloride wherein the gas is at an elevated temperature in the range of from about 300.degree. F. to about 3000.degree. F. and is produced from the thermal decomposition of material contaminated with hazardous chlorinated organic compounds. The waste gas is contacted in a reaction unit with an alkaline brine solution under conditions such that hydrogen chloride in the waste gas reacts with the alkali to form a chloride salt and water. The heat of the gas evaporates water from the solution to maintain the salt concentration sufficiently high to cause the formation of salt crystals in the solution. The gas is conducted from the reaction unit following contact with the solution under conditions such that the gas includes water evaporated from the solution. The salt crystals are removed as a solid product of the process and water and alkali are added to compensate for water vaporized from the solution and alkali consumed in the reaction. The process requires no external heat input and there is no liquid discharge.