The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 05, 1991
Filed:
Jul. 10, 1989
Joachim Szczyrbowski, Goldbach, DE;
Stephan Rogels, Rodenbach, DE;
Anton Dietrich, Triesen, LI;
Klaus Hartig, Ronneburg, DE;
Leybold Aktiengesellschaft, Hanau, DE;
Abstract
Process for coating transparent substrates, for example float glass, with a transparent dielectric layer having a low refractive index (n<1.7) at a high layer growth rate (>6.0A cm.sup.2 /W sec) by means of reactive direct current cathode sputtering. A vacuum chamber includes a cathode 5 which is provided on one of its surfaces with the material (target) to be sputtered and deposited on the substrate 3. The material to be sputtered (target) is a silicide, preferably nickel disilicide (NiSi.sub.2), and the layer deposited on the substrate is the corresponding oxide, for example NiSi-oxide. The reactive gas introduced into the vacuum chamber is oxygen and the process gas is a noble gas.