The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 05, 1991

Filed:

Apr. 19, 1990
Applicant:
Inventor:

Yuuji Omata, Ibaraki, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C25D / ;
U.S. Cl.
CPC ...
204 44 ; 204 445 ;
Abstract

A method of manufacturing a high magnetic flux density quaternary alloy electrodeposited thin film, comprising the steps of: forming an FeCoNiCr or an FeCoNiCu quaternary alloy thin film on a cathode by using an electrodepositing electrolyte bath to which four types of ions of Fe, Co, Ni and Cr or Cu have been supplied through sulfate and/or hydrochloride, each of which contains bivalent or tervalent Fe, Co, Ni, Cr and Cu ions, by using a bath having on the basis of the density of [Ni.sup.2+ ] ion such compositions as 0.02<[Co.sup.2+ ]/[Ni.sup.2+ ]<0.9, 0.095<[Fe.sup.2+ ]/[Ni.sup.2+ ]<0.4 and 0.075<[Cr.sup.3+ ]/[Ni.sup.2+ ]<0.4, or 0.001<[Cu.sup.2+ ]/[Ni.sup.2+ ]<0.03; and arranging electrodeposition current density J to be in a range of J<60 (mA/cm.sup.2) at the cathode.


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