The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 05, 1991
Filed:
Oct. 14, 1988
Jacques Schmitt, La Ville Du Bois, FR;
Solems (S.A.), Palaiseau, FR;
Abstract
Apparatus for producing thin film materials in a plasma deposit process. An enclosure is provided including a plasma zone. The apparatus removes non-deposited, residual gaseous reagents from the enclosure after heating the plasma zone for a predetermined time. An airtight chamber surrounds the enclosure and is kept at a pressure lower than the pressure within the enclosure. A screen is provided for directing heat to the enclosure, while maintaining the chamber walls at a lower temperature. In one embodiment of the invention, metal bellows are provided to apply a substrate support plate against a side wall of the enclosure sealing the substrate support with one of the side walls of the enclosure.